Nicholas Riedel Ph.D. defense
Wednesday, March 21, 2012, 01:10 PM
Lory Student Center, Room 203

Advisors: John Williams, Ketul Popat Committee: Amy Prieto, Don Radford, Melissa Reynolds.

Plasma Processing for Nanostructured Topographies

Abstract Plasma and directed ion interactions with materials have been widely observed to create complex surface patterns on a micro- and nano- scale. Generally, these texturizations are byproducts of another intended application (such as a feature formation on a sputtering target) and patterning is considered inconsequential or even detrimental. This work examined the possibility of using these phenomena as primary methods for producing beneficial topographies. Specifically, investigations focused on the use of helium plasma exposure and directed ion etching to create nanostructured surfaces capable of affecting biological interactions with implanted materials. Orthogonal argon ion etching and low energy helium plasma texturization of titanium were considered for use on orthopedic and dental implants as a means of increasing osteoblast activity and bone attachment; oblique angle etching was evaluated for its use in creating topographies with cell deterrent or anti-thrombogenic properties. In addition, the helium driven evolution of surface features on 6061 and 2024 aluminum alloys were characterized with respect to ion energy and substrate temperature. These surfaces were then considered for ice phobic applications.

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Event Contact: Zulema Sierra can be reached at (970) 491-6036

Sponsored by the Department of Mechanical Engineering.